LAM 810-002895-002

Product Category: Semiconductor Wafer Processing Consumable — Focus Ring Product Introduction: The 810-002895-002 is a silicon-coated focus ring used in LAM etch reactors. It sits around the wafer periphery and controls the plasma density profile at the wafer edge, improving etch uniformity and reducing edge non-uniformity.

LAM 810-046015-010

Product Name: LAM Research 810-046015-010 — Ceramic Electrostatic Chuck (ESC) Assembly Product Overview: This is a ceramic-based electrostatic chuck designed for semiconductor wafer clamping during plasma etch and deposition processes. It provides reliable, uniform clamping force across the wafer surface.

LAM 810-048219-015

Product Category: Semiconductor Wafer Processing Consumable — Gas Inlet Hardware Product Introduction: This is a silicon-coated gas distribution plate (GDP) used in LAM etch reactors. It sits between the shower head and the process gas inlet, ensuring even gas flow to the shower head orifices. The YSZ coating prevents corrosion from fluorine-based plasmas.

LAM 810-066590-004

Product Name: LAM Research 810-066590-004 — Focus Ring Assembly (300 mm) Product Overview: A replaceable focus ring used in LAM etch chambers to control plasma density distribution at the wafer edge, improving etch uniformity and reducing edge non-uniformity.

LAM 810-068158-014

Product Name: LAM Research 810-068158-014 — Gas Distribution Showerhead (300 mm, Dual-Frequency) Product Overview: A dual-frequency (2 MHz + 13.56 MHz) gas showerhead assembly for LAM etch chambers, enabling independent control of ion energy and plasma density.

LAM 810-068158-015

Product Name: LAM Research 810-068158-015 — Gas Distribution Showerhead (300 mm, Single-Frequency) Product Overview: A single-frequency (13.56 MHz or 2 MHz) gas showerhead for LAM etch chambers, optimized for high-throughput etch applications.

LAM 810-069751-114

Product Name: LAM Research 810-069751-114 — Chamber Liner Kit (300 mm Etch Chamber) Product Overview: A full replacement liner kit for LAM 300 mm etch chambers, including chamber wall protection, grounding straps, and consumable shield components.

LAM 810-072906-005

Product Name: LAM Research 810-072906-005 — RF Matching Network (300 mm, 2 MHz/13.56 MHz) Product Overview: An automatic RF impedance matching network for dual-frequency LAM etch chambers, ensuring maximum power transfer from the RF generator to the plasma load.

LAM 810-072907-005

Product Name: LAM Research 810-072907-005 — RF Matching Network (300 mm, Single-Frequency 13.56 MHz) Product Overview: An automatic RF impedance matching network for single-frequency (13.56 MHz) LAM etch chambers.

LAM 810-082745-003

Product Name: LAM Research 810-082745-003 — Helium Backside Cooling Manifold Assembly Product Overview: A precision helium gas manifold assembly for backside wafer cooling on LAM 300 mm ceramic ESC chucks, enabling sub-ambient to elevated temperature processing.

LAM 810-091934-00

Product Name: LAM Research 810-091934-00 — RF Bias Power Supply (300 mm, 13.56 MHz, 4000 W) Product Overview: A high-frequency RF bias power supply for LAM 300 mm etch chambers, providing independent control of ion bombardment energy at the wafer surface.

LAM 810-099175-012

Product Name: LAM Research 810-099175-012 — Edge Ring / Wafer Guard Ring (300 mm, Silicon) Product Overview: A silicon edge ring (wafer guard ring) used on LAM 300 mm electrostatic chucks to protect the wafer edge from plasma exposure and reduce edge bevel during etch processes.