LAM 810-048219-015

Product Category: Semiconductor Wafer Processing Consumable — Gas Inlet Hardware

Product Introduction:
This is a silicon-coated gas distribution plate (GDP) used in LAM etch reactors. It sits between the shower head and the process gas inlet, ensuring even gas flow to the shower head orifices. The YSZ coating prevents corrosion from fluorine-based plasmas.

Category:
Description

Technical Specifications:

Parameter Value
Part Number 810-048219-015
Coating Material Yttria-Stabilized Zirconia (YSZ)
Base Material 6061-T6 Aluminum Alloy
Coating Thickness 150–300 μm
Operating Temperature Up to 350°C
Compatible Reactors LAM 2300 Flex, SPE, Kiyo, Systm One
Gas Channels Precision-machined internal manifold

Functional Features:

  • Distributes process gas evenly to shower head
  • YSZ coating provides plasma erosion resistance
  • Machined internal channels prevent gas stagnation

Performance Parameters:

  • Gas Flow Uniformity: ≤ ±2% (manifold-to-orifice)
  • Erosion Rate: < 0.5 μm/hour
  • Service Life: 200–400 process hours

Material Composition:

Component Material
Body 6061-T6 Aluminum
Coating YSZ (8% Y₂O₃-ZrO₂)
Seal Surface Anodized Aluminum

Working Principle:
Process gas enters through a central port, flows through internal machined channels, and exits uniformly to the shower head. The YSZ coating protects the aluminum from reactive plasma species.

Key Advantages:

  • Ensures gas uniformity critical for etch process control
  • Long service life reduces chamber downtime

Applicable Industries:

  • Semiconductor Front-End Fab

Installation Requirements:

  • Install in ISO Class 5 cleanroom
  • Torque to 5–7 N·m
  • Leak check at 10⁻⁶ Torr·L/s

Usage Precautions:

  • Replace per preventive maintenance schedule
  • Do not operate without coating intact
  • Store in nitrogen-purged container
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