AMAT 0100-71311

Model Series: Centura / Endura PVD Modules Product Description: A pneumatically actuated throttle valve used to control chamber pressure in AMAT physical vapor deposition (PVD) and sputter systems. It regulates gas flow to maintain precise process pressure during thin-film deposition.

AMAT 0100-76124

Model Series: Centura / Producer Bias Systems Product Description: A high-voltage DC power supply module used to generate substrate bias voltage in AMAT plasma etch chambers. It provides precise DC bias control from 0V to -5000V for ion energy control during anisotropic etching.

AMAT 0100-77037

Model Series: HiPace Series Equivalent Product Description: A high-capacity turbomolecular vacuum pump used in AMAT cluster tools and standalone process chambers. It achieves high vacuum and ultra-high vacuum conditions required for sputtering, CVD, and etch processes.

AMAT 0190-07970

Product Series: Applied Materials P5000 / Centura Etch Systems Product Introduction: The 0190-07970 is a gas distribution manifold used in Applied Materials semiconductor etch and deposition chambers. It precisely routes process gases (e.g., CF₄, Cl₂, O₂, Ar, N₂) from gas cabinets to the showerhead or pedestal within the chamber.

AMAT 0190-15779

Technical Specifications
  • Control Precision: High-resolution encoder enables precise positioning and motion control with minimal error margins.
  • Torque and Inertia: Features high torque output and low inertia for rapid response to control signals, enhancing dynamic system performance.
  • Speed Range: Operates efficiently across a wide speed range, adapting to varying load conditions without compromising stability.
  • Cooling Design: Optimized cooling system ensures stable performance during prolonged high-speed operation, extending service life.
  • Construction: Built with high-quality materials and robust components to withstand harsh industrial conditions, including vibration and temperature fluctuations.

AMAT 0190-26873

Product Series: Applied Materials Centura / Producer PECVD & Etch Systems Product Introduction: The 0190-26873 is an RF impedance match network used in Applied Materials plasma etch and PECVD chambers. It matches the 50 Ω output of the RF generator to the variable impedance of the plasma load, maximizing power transfer and minimizing reflected power.

AMAT 0190-27952

Product Series: Applied Materials Centura / Producer Etch Systems Product Introduction: The 0190-27952 is a Johnson-Rahbek electrostatic chuck used to clamp semiconductor wafers during plasma etch processes. It provides uniform clamping force across the wafer surface using high-voltage DC applied between the chuck electrodes and the wafer.

AMAT 0190-30354

Product Series: Applied Materials / Brooks Instrument SLA5850 Series Product Introduction: The 0190-30354 is a thermal mass flow controller used in AMAT semiconductor process chambers. It precisely controls the flow rate of process gases (e.g., Ar, O₂, N₂, CF₄, Cl₂) with high accuracy and fast response.

AMAT 0190-37519

Product Series: Applied Materials Centura / Producer Etch Systems Product Introduction: The 0190-37519 is a replaceable chamber liner/shield ring used in AMAT plasma etch chambers. It protects the chamber walls from plasma erosion and deposits, and defines the plasma boundary for process uniformity.

AMAT 0190-37684

Product Series: Applied Materials Centura / Producer Etch Systems Product Introduction: The 0190-37684 is a pneumatic throttle valve used in AMAT semiconductor process chambers. It controls the chamber pressure by adjusting the conductance between the chamber and the throttle pump, enabling precise pressure control from 1 mTorr to 100 Torr.

AMAT 0190-49518

Product Series: Applied Materials Matcher / RPG Series Product Introduction: The 0190-49518 is a 13.56 MHz RF power generator used in AMAT PECVD, etch, and sputtering chambers. It delivers up to 5000 W of RF power to the plasma via a matching network.

AMAT 0190-51414

Product Series: Applied Materials P5000 / Centura Cleaning Systems Product Introduction: The 0190-51414 is a UV lamp housing assembly used in AMAT wet cleaning and photoresist strip chambers. It houses a broadband UV lamp (typically 200–400 nm) that generates UV radiation to enhance chemical cleaning reactions (photo-activated cleaning).