LAM 810-091934-00

Product Name: LAM Research 810-091934-00 — RF Bias Power Supply (300 mm, 13.56 MHz, 4000 W)

Product Overview: A high-frequency RF bias power supply for LAM 300 mm etch chambers, providing independent control of ion bombardment energy at the wafer surface.

Category:
Description

Technical Specifications:

  • Type: RF Bias Power Supply
  • Frequency: 13.56 MHz (fixed)
  • Power Rating: 0 ~ 4000 W
  • Impedance: 50 Ω (auto-match)
  • Output Voltage: 0 ~ 2000 Vpp
  • Output Current: 0 ~ 10 A
  • Cooling: Water-cooled (18°C inlet)

Functional Features:

  • Independent bias control — decoupled from source power for anisotropic etch tuning
  • Auto-matching network — maintains 50 Ω match across all load conditions
  • Pulse modulation capable — supports pulsed bias for advanced etch profiles

Performance Parameters:

Parameter Value
Frequency 13.56 MHz
Max Power 4000 W
Output Voltage 0 ~ 2000 Vpp
Output Current 0 ~ 10 A
Matching Range 5 ~ 2000 Ω (auto)
Pulse Frequency 100 Hz ~ 100 kHz (optional)
Duty Cycle 10% ~ 90% (optional)
Efficiency > 85%
Cooling Water, 18°C, 3 L/min

Material Composition:

  • Power Transistors: LDMOS (Laterally Diffused MOS)
  • Output Network: PI-network with vacuum variable capacitors
  • Housing: 304 Stainless Steel, 19-inch rack (3U)
  • Connectors: 7/16 DIN (50 Ω)

Structural Features:

  • 19-inch rack-mountable (3U height)
  • Front panel: LCD display, rotary controls, status LEDs
  • Rear panel: RF output, water connections, RS-232, Ethernet
  • Fan-assisted air cooling with water-cooled final stage

Working Principle: An LDMOS RF amplifier generates 13.56 MHz power. An automatic PI-network matching circuit adjusts the output impedance to maintain 50 Ω match to the chamber load, ensuring maximum power transfer. Pulse modulation is achieved by gating the LDMOS driver with a high-speed MOSFET switch.

Advantages:

  • Decoupled bias control enables independent tuning of etch rate vs. anisotropy
  • Pulse capability supports scallop-free trench etching for 3D NAND
  • High efficiency (>85%) reduces operational cost

Applicable Industries: Semiconductor — Anisotropic Etch, HAR Etch, 3D NAND, DRAM Trench Etch

Model Series: LAM 810-091xxx Series — 300 mm 13.56 MHz Bias Power Supply

Installation Requirements:

  • Mount in 19-inch rack (3U), minimum 100 mm clearance on all sides
  • Connect 7/16 DIN RF output to chamber (max 2 m cable)
  • Connect water cooling (18°C, 3 L/min, 2 bar pressure)
  • Connect RS-232/Ethernet to fab host system
  • Ground chassis to facility ground (< 1 Ω)

Usage Notes:

  • Do not operate with water cooling off — thermal shutdown at 55°C
  • Calibrate output power quarterly with RF power meter
  • Replace LDMOS modules every 80,000 wafers or 5 years (whichever comes first)
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