LAM 810-068158-015

Technical Specifications:

• Type: Single-Frequency Gas Showerhead
• Diameter: 300 mm
• Frequency: 13.56 MHz (standard) or 2 MHz (optional)
• Number of Gas Zones: 3 ~ 5 zones
• Material: Anodized Aluminum (6061-T6) with Y₂O₃ coating
• Operating Temperature: Up to 200°C

Functional Features:

• Simplified RF architecture — single frequency reduces system complexity
• Uniform gas distribution across 300 mm wafer
• Cost-effective alternative to dual-frequency showerhead for non-critical applications

Performance Parameters:

Material Composition:

• Body: 6061-T6 Aluminum, hard anodized
• Coating: Yttrium Oxide (Y₂O₃)
• Seals: Kalrez 7075
• Fasteners: 316L Stainless Steel

Structural Features:

• Circular plate with uniform gas hole pattern
• 3-zone or 5-zone internal manifold
• RF electrode integrated into showerhead body

Working Principle: Gas flows through internal channels and exits through precision holes, creating uniform gas distribution over the wafer. Single-frequency RF power generates plasma for etching. Ion energy is controlled by adjusting RF power and chamber pressure.

Advantages:

• Lower cost of ownership vs. dual-frequency variant
• Simplified maintenance — fewer RF components
• Adequate performance for mature-node etch applications (≥28 nm)

Applicable Industries: Semiconductor — Metal Etch, Oxide Etch, Poly Si Etch, Mature Node Logic

Model Series: LAM 810-068xxx Series — 300 mm Single-Freq Showerhead

Installation Requirements:

• Mount to chamber ceiling using alignment pins
• Connect gas lines (VCR or Swagelok fittings)
• Connect single RF line (50 Ω)
• Verify gas flow balance across all zones

Usage Notes:

• Perform preventive cleaning every 8,000 wafers
• Inspect Y₂O₃ coating for flaking during scheduled maintenance
• Replace showerhead when uniformity degrades beyond 3%