Show sidebar
Show 9 12 18 24
Clear filters

KUKA RDW2 Resolver Digital Converter

Technical Specifications
  • Compatibility: Works with KUKA KRC2 and later controller generations.
  • Input Support:
    • Accepts analog resolver signals (e.g., sine/cosine waveforms).
    • Supports incremental and absolute encoders (e.g., Hiperface, EnDat, SFD-M).
  • Output:
    • Digital signal conversion for resolver data.
    • Sampling rate: Up to 120 MHz for high-speed data acquisition.
  • Power Requirements:
    • Operates with standard industrial power supplies (e.g., 240V AC).
  • Environmental Resistance:
    • Robust design for industrial environments with shielding against electromagnetic interference (EMI) and radio-frequency interference (RFI).
  • Physical Attributes:
    • Compact form factor for cabinet or DIN rail mounting.
    • Metal enclosure for durability.
Read more
Quick view

LAETUS LLS570-05

  • Product Name: LAETUS LLS570-05 Laser Inspection System (High-Speed Vision Sensor)
  • Product Introduction: A high-performance laser-based inspection unit for label integrity, printing quality, and code readability verification in pharmaceutical, food, and packaging lines.
Read more
Quick view

LAM 605-108114-003

Product Category: Semiconductor Wafer Processing Consumable — Plasma Etch Chamber Component Product Introduction: This is a precision-machined silicon-coated aluminum shower head used in LAM Research plasma etch reactors. It delivers process gas uniformly across the wafer surface during dry etching operations. The silicon coating (YSZ — Yttria-Stabilized Zirconia) provides superior plasma erosion resistance and extends service life.
Read more
Quick view

LAM 605-109114-001

Product Category: Semiconductor Wafer Processing Consumable Product Introduction: This is an alternate variant of the silicon-coated shower head, designed for different gas chemistries or chamber configurations within the same LAM etch platform family. It features the same YSZ-coated construction but with a modified orifice pattern or gas channel geometry optimized for specific etch recipes (e.g., oxide etch, nitride etch, or metal etch).
Read more
Quick view

LAM 61-380630-00

Series: 61-380000 Series Product Overview: The LAM 61-380630-00 is a thermal mass flow controller designed for semiconductor process equipment. It precisely controls the flow of process gases (such as N₂, O₂, Ar, CF₄, SF₆, Cl₂) using the thermal dispersion principle. It is used in LAM etching and deposition systems.
Read more
Quick view

LAM 61-428059-00

Technical Specifications

There is limited specific technical specification information available at present. However, it is known that the product has a firmware version of V.1.514 and is associated with part number 785 - 179350 - 002.
Read more
Quick view

LAM 685-247270-001

Product Category: Semiconductor Wafer Processing Component Product Introduction: This is the base/reference variant of the 685-247270 ESC family, typically specifying the Al₂O₃-coated version (as opposed to the AlN variant in -101). It serves the same function in LAM etch and deposition chambers with identical mounting and electrical interface.
Read more
Quick view

LAM 685-247270-101

Product Category: Semiconductor Wafer Processing Component — Wafer Clamping Device Product Introduction: This is a ceramic-coated electrostatic chuck (ESC) used in LAM Research etch and deposition reactors. It holds wafers securely via electrostatic force during plasma processing. The ceramic coating (Al₂O₃ or AlN) provides electrical insulation and thermal conductivity for precise wafer temperature control.
Read more
Quick view

LAM 810-001489-016

Product Category: Semiconductor Wafer Processing Consumable — Chamber Liner Product Introduction: This is a silicon-coated aluminum chamber liner (shield) used in LAM Research plasma etch reactors. It protects the chamber walls from plasma erosion and provides a controlled surface for process chemistry interaction. The YSZ coating ensures long life and low particle generation.
Read more
Quick view

LAM 810-002895-002

Product Category: Semiconductor Wafer Processing Consumable — Focus Ring Product Introduction: The 810-002895-002 is a silicon-coated focus ring used in LAM etch reactors. It sits around the wafer periphery and controls the plasma density profile at the wafer edge, improving etch uniformity and reducing edge non-uniformity.
Read more
Quick view

LAM 810-046015-010

Product Name: LAM Research 810-046015-010 — Ceramic Electrostatic Chuck (ESC) Assembly Product Overview: This is a ceramic-based electrostatic chuck designed for semiconductor wafer clamping during plasma etch and deposition processes. It provides reliable, uniform clamping force across the wafer surface.
Read more
Quick view

LAM 810-048219-015

Product Category: Semiconductor Wafer Processing Consumable — Gas Inlet Hardware Product Introduction: This is a silicon-coated gas distribution plate (GDP) used in LAM etch reactors. It sits between the shower head and the process gas inlet, ensuring even gas flow to the shower head orifices. The YSZ coating prevents corrosion from fluorine-based plasmas.
Read more
Quick view