Others

Product Name: LAM Research 810-066590-004 — Focus Ring Assembly (300 mm) Product Overview: A replaceable focus ring used in LAM etch chambers to control plasma density distribution at the wafer edge, improving etch uniformity and reducing edge non-uniformity.

Product Name: LAM Research 810-068158-014 — Gas Distribution Showerhead (300 mm, Dual-Frequency) Product Overview: A dual-frequency (2 MHz + 13.56 MHz) gas showerhead assembly for LAM etch chambers, enabling independent control of ion energy and plasma density.

Product Name: LAM Research 810-072906-005 — RF Matching Network (300 mm, 2 MHz/13.56 MHz) Product Overview: An automatic RF impedance matching network for dual-frequency LAM etch chambers, ensuring maximum power transfer from the RF generator to the plasma load.

Product Name: LAM Research 810-072907-005 — RF Matching Network (300 mm, Single-Frequency 13.56 MHz) Product Overview: An automatic RF impedance matching network for single-frequency (13.56 MHz) LAM etch chambers.

Product Name: LAM Research 810-099175-012 — Edge Ring / Wafer Guard Ring (300 mm, Silicon) Product Overview: A silicon edge ring (wafer guard ring) used on LAM 300 mm electrostatic chucks to protect the wafer edge from plasma exposure and reduce edge bevel during etch processes.

Product Name: LAM 810-102361-222 — RF Match Network Assembly Product Overview: High-frequency RF match network module used in semiconductor plasma etch and deposition equipment. The unit provides impedance matching between the RF generator and the process chamber to maximize power transfer efficiency.