LAM 605-109114-001

Product Category: Semiconductor Wafer Processing Consumable

Product Introduction:
This is an alternate variant of the silicon-coated shower head, designed for different gas chemistries or chamber configurations within the same LAM etch platform family. It features the same YSZ-coated construction but with a modified orifice pattern or gas channel geometry optimized for specific etch recipes (e.g., oxide etch, nitride etch, or metal etch).

Category:
Description

Technical Specifications:

  • Part Number: 605-109114-001
  • Coating Material: Yttria-Stabilized Zirconia (YSZ)
  • Base Material: 6061-T6 Aluminum Alloy
  • Operating Temperature: Up to 350°C
  • Compatible Reactors: LAM 2300 Flex, SPE, TEL-licensed etch tools
  • Orifice Pattern: Customized for specific gas flow profile

Functional Features:

  • Tailored gas distribution for non-uniform etch recipes
  • YSZ coating provides plasma resistance identical to 605-108114-003
  • Interchangeable within same chamber family

Performance Parameters:

  • Gas Uniformity: ≤ ±3% (wafer-level)
  • Service Life: 80–150 process hours
  • Particle Performance: < 10 particles/cm²

Material Composition:

Component Material
Body 6061-T6 Aluminum
Coating YSZ (8% Y₂O₃-ZrO₂)

Key Advantages:

  • Recipe-specific optimization
  • Same coating durability as 605-108114-003
  • Drop-in replacement for qualified chambers

Applicable Industries:

  • Semiconductor Front-End Fabrication

Installation Requirements:

  • Same as 605-108114-003: Torque 5–7 N·m, ISO Class 5 cleanroom

Usage Precautions:

  • Do not mix with uncoated shower heads in same chamber
  • Verify part number match before installation
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