AMAT 0100-71224

Manufacturer: Applied Materials, Inc. Product Overview: Automatic impedance matching network used in AMAT sputter and PECVD chambers. This assembly dynamically matches the RF generator output (typically 13.56 MHz or 2 MHz) to the varying plasma load impedance during process transitions.

AMAT 0100-71229

Manufacturer: Applied Materials, Inc. Product Overview: Solid-state RF power generator delivering 13.56 MHz output for plasma-enhanced processes in AMAT PECVD and etch chambers. Replaces legacy tube-based generators with higher reliability and faster modulation.

AMAT 0100-71267 Semiconductor Control Module

echnical Specifications:
  • Compatibility: Designed specifically for integration with Applied Materials' semiconductor processing systems.
  • Electrical Characteristics: Details about voltage requirements, current ratings, and power consumption would be specified in technical documentation tailored to its specific application within the system.
  • Physical Attributes: Dimensions and weight suitable for installation within semiconductor manufacturing equipment, ensuring compatibility with existing hardware and facilitating ease of replacement or maintenance.
  • Environmental Tolerance: Engineered to withstand the demanding conditions inside semiconductor fabrication facilities, including resistance to electromagnetic interference, temperature variations, and particulate matter.

AMAT 0100-71271

Model Series: Centura / Endura Process Modules Product Description: This is a precision gas distribution component used in Applied Materials plasma etch and deposition chambers. It functions as a showerhead that delivers process gases uniformly across the wafer surface during thin-film deposition or etching operations.

AMAT 0100-71275

Model Series: Centura / Endura Etch Modules Product Description: A high-purity alumina ceramic insulator ring used in AMAT plasma etch chambers. It provides electrical isolation between the RF-powered electrode and the grounded chamber wall while withstanding high thermal loads.

AMAT 0100-71278

Model Series: Centura / Producer Platforms Product Description: A variable vacuum capacitor used in the RF matching network of AMAT plasma process chambers. It enables real-time impedance matching between the RF generator and the plasma load for maximum power transfer.

AMAT 0100-71309

Model Series: Endura / Centura Etch Chambers Product Description: A replaceable chamber liner (also called chamber wall panel) that lines the interior of AMAT plasma etch chambers. It protects the chamber body from plasma erosion and chemical attack while contributing to process uniformity.

AMAT 0100-71311

Model Series: Centura / Endura PVD Modules Product Description: A pneumatically actuated throttle valve used to control chamber pressure in AMAT physical vapor deposition (PVD) and sputter systems. It regulates gas flow to maintain precise process pressure during thin-film deposition.

AMAT 0100-76124

Model Series: Centura / Producer Bias Systems Product Description: A high-voltage DC power supply module used to generate substrate bias voltage in AMAT plasma etch chambers. It provides precise DC bias control from 0V to -5000V for ion energy control during anisotropic etching.

AMAT 0100-77037

Model Series: HiPace Series Equivalent Product Description: A high-capacity turbomolecular vacuum pump used in AMAT cluster tools and standalone process chambers. It achieves high vacuum and ultra-high vacuum conditions required for sputtering, CVD, and etch processes.

AMAT 0100‑00003

Product Name: Stepper Motor Driver Module for Semiconductor Wafer Handling Product Brief: Original Applied Materials motion control drive module deployed on Endura semiconductor processing platforms, drives two‑phase hybrid stepper motors to implement precise wafer transfer robot arm positioning and movement for vacuum wafer handling chambers.

AMAT 0100‑71304

Product Name: Semiconductor Equipment Analog Signal Interface Module Product Brief: Applied Materials signal conditioning I/O module, converts low‑level field sensor analogue signals into digital bus‑compatible signals for cluster tool process monitoring and closed‑loop process control inside semiconductor fabrication tools.