AMAT 0100-71271

Model Series: Centura / Endura Process Modules

Product Description:
This is a precision gas distribution component used in Applied Materials plasma etch and deposition chambers. It functions as a showerhead that delivers process gases uniformly across the wafer surface during thin-film deposition or etching operations.

Category:
Description

Technical Specifications:

  • Part Number: 0100-71271
  • Compatible Systems: Applied Materials Centura, Endura, Producer platforms
  • Material: Anodized Aluminum Alloy (6061-T6) with Silicon Carbide (SiC) coating
  • Diameter: 300mm (12-inch wafer compatible)
  • Number of Gas Zones: 3-zone radial distribution
  • Operating Temperature Range: -20°C to +200°C
  • Max Operating Pressure: 10 Torr

Key Features:

  • Uniform Gas Distribution: Engineered orifice pattern ensures <3% non-uniformity across wafer surface
  • SiC Coated Surface: Resists plasma-induced erosion and corrosion from fluorine-based chemistries
  • Modular Design: Quick-swap replacement for scheduled maintenance
  • Electrostatic Chuck Compatible: Designed for integration with AMAT electrostatic wafer clamps

Applicable Industry: Semiconductor Manufacturing — Advanced Logic, Memory, Foundry

Installation Requirements:

  • Install in cleanroom environment (ISO Class 5 or better)
  • Torque mounting bolts to 8 Nm per AMAT service manual
  • Verify gas leak integrity at 500 sccm N₂ before process qualification

Usage Notes:

  • Replace after 2000 process hours or when non-uniformity exceeds 5%
  • Do not use abrasive cleaning agents on SiC surface
  • Store in nitrogen-purged container when not installed
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