LAM 810-091934-00
LAM 810-082745-003
LAM 810-072907-005
LAM 810-072906-005
LAM 810-069751-114
LAM 810-068158-015
LAM 810-068158-014
LAM 810-066590-004
LAM 810-046015-010
Product Name: LAM Research 810-046015-010 — Ceramic Electrostatic Chuck (ESC) Assembly
Product Overview: This is a ceramic-based electrostatic chuck designed for semiconductor wafer clamping during plasma etch and deposition processes. It provides reliable, uniform clamping force across the wafer surface.
LAM 810-048219-015
Product Category: Semiconductor Wafer Processing Consumable — Gas Inlet Hardware
Product Introduction:
This is a silicon-coated gas distribution plate (GDP) used in LAM etch reactors. It sits between the shower head and the process gas inlet, ensuring even gas flow to the shower head orifices. The YSZ coating prevents corrosion from fluorine-based plasmas.
LAM 810-002895-002
Product Category: Semiconductor Wafer Processing Consumable — Focus Ring
Product Introduction:
The 810-002895-002 is a silicon-coated focus ring used in LAM etch reactors. It sits around the wafer periphery and controls the plasma density profile at the wafer edge, improving etch uniformity and reducing edge non-uniformity.
LAM 810-001489-016
Product Category: Semiconductor Wafer Processing Consumable — Chamber Liner
Product Introduction:
This is a silicon-coated aluminum chamber liner (shield) used in LAM Research plasma etch reactors. It protects the chamber walls from plasma erosion and provides a controlled surface for process chemistry interaction. The YSZ coating ensures long life and low particle generation.
