AMAT 0100-71275
AMAT 0100-71271
Model Series: Centura / Endura Process Modules
Product Description:
This is a precision gas distribution component used in Applied Materials plasma etch and deposition chambers. It functions as a showerhead that delivers process gases uniformly across the wafer surface during thin-film deposition or etching operations.
Vibro-Meter 200-510-071-113 200-510-111-034 VM600MPC4
Product Series: VM600 Series
Product Introduction:
The VM600MPC4 is a 4-channel vibration monitoring and machinery protection system manufactured by Vibro-Meter (Brüel & Kjær Vibro). It provides continuous vibration monitoring, trending, and alarm/trip functionality for rotating machinery including turbines, compressors, pumps, motors, and generators.
AMAT 0190-51414
Product Series: Applied Materials P5000 / Centura Cleaning Systems
Product Introduction:
The 0190-51414 is a UV lamp housing assembly used in AMAT wet cleaning and photoresist strip chambers. It houses a broadband UV lamp (typically 200–400 nm) that generates UV radiation to enhance chemical cleaning reactions (photo-activated cleaning).
AMAT 0190-37684
Product Series: Applied Materials Centura / Producer Etch Systems
Product Introduction:
The 0190-37684 is a pneumatic throttle valve used in AMAT semiconductor process chambers. It controls the chamber pressure by adjusting the conductance between the chamber and the throttle pump, enabling precise pressure control from 1 mTorr to 100 Torr.
AMAT 0190-49518
AMAT 0190-37519
Product Series: Applied Materials Centura / Producer Etch Systems
Product Introduction:
The 0190-37519 is a replaceable chamber liner/shield ring used in AMAT plasma etch chambers. It protects the chamber walls from plasma erosion and deposits, and defines the plasma boundary for process uniformity.
AMAT 0190-30354
Product Series: Applied Materials / Brooks Instrument SLA5850 Series
Product Introduction:
The 0190-30354 is a thermal mass flow controller used in AMAT semiconductor process chambers. It precisely controls the flow rate of process gases (e.g., Ar, O₂, N₂, CF₄, Cl₂) with high accuracy and fast response.
AMAT 0190-27952
Product Series: Applied Materials Centura / Producer Etch Systems
Product Introduction:
The 0190-27952 is a Johnson-Rahbek electrostatic chuck used to clamp semiconductor wafers during plasma etch processes. It provides uniform clamping force across the wafer surface using high-voltage DC applied between the chuck electrodes and the wafer.
AMAT 0190-26873
Product Series: Applied Materials Centura / Producer PECVD & Etch Systems
Product Introduction:
The 0190-26873 is an RF impedance match network used in Applied Materials plasma etch and PECVD chambers. It matches the 50 Ω output of the RF generator to the variable impedance of the plasma load, maximizing power transfer and minimizing reflected power.
AMAT 0190-07970
Product Series: Applied Materials P5000 / Centura Etch Systems
Product Introduction:
The 0190-07970 is a gas distribution manifold used in Applied Materials semiconductor etch and deposition chambers. It precisely routes process gases (e.g., CF₄, Cl₂, O₂, Ar, N₂) from gas cabinets to the showerhead or pedestal within the chamber.
