LAM 685-247270-001

Product Category: Semiconductor Wafer Processing Component

Product Introduction:
This is the base/reference variant of the 685-247270 ESC family, typically specifying the Al₂O₃-coated version (as opposed to the AlN variant in -101). It serves the same function in LAM etch and deposition chambers with identical mounting and electrical interface.

Category:
Description

Technical Specifications:

Parameter Value
Part Number 685-247270-001
Coating Material Aluminum Oxide (Al₂O₃, 96% purity)
Coating Thickness 200–400 μm
Base Material 6061-T6 Aluminum
Clamping Voltage 0–3000 VDC
Operating Temperature -20°C to +200°C
Thermal Conductivity 24–30 W/m·K
Compatible Reactors LAM 2300 Flex, SPE, Kiyo, Systm One

Functional Features:

  • Identical to 685-247270-101 except coating material (Al₂O₃ vs. AlN)
  • Al₂O₃ variant offers lower thermal conductivity but higher dielectric strength
  • Suitable for processes where extreme temperature uniformity is not critical

Performance Parameters:

  • Dielectric Strength: > 15 kV/mm (Al₂O₃ advantage over AlN)
  • Temperature Uniformity: ±2°C (slightly less than AlN variant)
  • Service Life: 5,000–10,000 wafers

Material Composition:

Component Material
Base 6061-T6 Aluminum
Coating Al₂O₃ (96% purity, plasma-sprayed)
Heater Molybdenum

Working Principle:
Same as 685-247270-101 — electrostatic clamping via DC voltage through ceramic dielectric.

Key Advantages:

  • Higher dielectric strength than AlN variant — better for high-voltage processes
  • Lower cost than AlN-coated version

Applicable Industries:

  • Semiconductor Front-End Fab

Installation Requirements:

  • Same as 685-247270-101

Usage Precautions:

  • Do not substitute with AlN variant without process qualification
  • Verify part number before installation
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