AMAT 0100-71224

Manufacturer: Applied Materials, Inc.

Product Overview:
Automatic impedance matching network used in AMAT sputter and PECVD chambers. This assembly dynamically matches the RF generator output (typically 13.56 MHz or 2 MHz) to the varying plasma load impedance during process transitions.

Category:
Description

Material Composition:

  • Variable CapacitorsVacuum Variable Capacitors (VVC) — Stainless steel rotor/stator, 0–500 pF
  • Inductors: Copper tubing — Silver-plated, air-core
  • Enclosure316L Stainless Steel — RF-shielded, grounded
  • Control InterfaceRS-485 / Ethernet — For recipe-controlled tuning
  • Relays: Panasonic AQV series — RF relay, 50 Ω, 2 kW rating

Technical Specifications:

Parameter Value
Frequency Range 0.5 – 13.56 MHz (dual-band)
Impedance Range 5 – 2,000 Ω (automatic)
Tuning Speed < 100 ms (full sweep)
Power Rating 2,000 W (continuous)
VSWR (after match) < 1.05:1
Control Digital — RS-485, Modbus RTU
Operating Temperature 20°C – 50°C
Standards SEMI S2, CE, FCC Part 15

Functional Characteristics:

  • Automatic real-time matching compensates for plasma impedance shifts during process
  • Dual-band operation — switches between 2 MHz (sputter) and 13.56 MHz (PECVD)
  • Reflected power protection — shuts down RF if VSWR > 3:1 for > 500 ms

Applicable Industries:
Semiconductor — PVD sputtering, PECVD, RIE etching

Installation Requirements:

  • Connect 50 Ω coaxial cable — type RG-213 or equivalent, max 5 m run
  • Ground enclosure to chamber ground point — resistance < 0.01 Ω
  • Configure Modbus address via DIP switches before first power-on
Reviews (0)

Reviews

There are no reviews yet.

Be the first to review “AMAT 0100-71224”

Your email address will not be published. Required fields are marked *

Shipping and Delivery

MAECENAS IACULIS

Vestibulum curae torquent diam diam commodo parturient penatibus nunc dui adipiscing convallis bulum parturient suspendisse parturient a.Parturient in parturient scelerisque nibh lectus quam a natoque adipiscing a vestibulum hendrerit et pharetra fames nunc natoque dui.

ADIPISCING CONVALLIS BULUM

  • Vestibulum penatibus nunc dui adipiscing convallis bulum parturient suspendisse.
  • Abitur parturient praesent lectus quam a natoque adipiscing a vestibulum hendre.
  • Diam parturient dictumst parturient scelerisque nibh lectus.

Scelerisque adipiscing bibendum sem vestibulum et in a a a purus lectus faucibus lobortis tincidunt purus lectus nisl class eros.Condimentum a et ullamcorper dictumst mus et tristique elementum nam inceptos hac parturient scelerisque vestibulum amet elit ut volutpat.