AMAT 0190-37519

Product Series: Applied Materials Centura / Producer Etch Systems

Product Introduction:
The 0190-37519 is a replaceable chamber liner/shield ring used in AMAT plasma etch chambers. It protects the chamber walls from plasma erosion and deposits, and defines the plasma boundary for process uniformity.

Category:
Description

Technical Specifications:

Parameter Value
Material Silicon (Si) or Silicon Carbide (SiC) — configurable
Diameter 200 mm / 300 mm (wafer-size matched)
Thickness 3–8 mm
Operating Temperature Up to 400°C
Plasma Exposure 100+ hours typical lifetime
Particle Spec < 0.3 µm (post-seasoning)
Surface Finish CMP-polished (Ra < 0.2 µm)

Material Composition:

  • Si Liner: Single-crystal Silicon (resistivity 1–10 Ω·cm)
  • SiC Liner: Reaction-bonded Silicon Carbide
  • Coating (optional): Yttria (Y₂O₃) or Alumina PVD coating

Structure Features:

  • Annular ring shape, fits inside chamber wall
  • Grooved or stepped profile for gas flow optimization
  • Alignment key for correct positioning
  • Replaceable without breaking chamber vacuum (slit valve access)

Working Principle:
The liner acts as a sacrificial barrier between the plasma and the chamber wall. It absorbs ion bombardment and chemical attack, preserving the expensive aluminum or stainless steel chamber body. The liner material also influences plasma chemistry (e.g., Si liner releases SiFₓ in CF₄ plasma).

Advantages & Highlights:

  • Extends chamber life by 3–5× vs. unlined chambers
  • CMP-polished surface minimizes particle generation
  • Configurable material (Si or SiC) for different process chemistries
  • Quick replacement via slit valve — < 30 min PM time

Applicable Industries:

  • Semiconductor Etch (DRIE, RIE, ICP)
  • MEMS
  • LED Manufacturing

Installation Requirements:

  • Install via chamber slit valve (do not break main vacuum)
  • Verify alignment key matches chamber orientation
  • Season the liner: run 10-hour seasoning recipe before production use
  • Torque retaining ring to AMAT spec (typically 8–12 in-lbs)

Usage Precautions:

  • Do not operate without liner — severe chamber damage
  • Replace when thickness loss exceeds 2 mm
  • Do not mix Si and SiC liners in the same chamber
  • Season every new liner before production wafers
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