AMAT 0100-20100

Manufacturer: Applied Materials, Inc.

Product Overview:
Precision-machined showerhead used in AMAT PECVD (Plasma Enhanced CVD) and ALD (Atomic Layer Deposition) chambers. Distributes process gas uniformly across the wafer surface through hundreds of micro-orifices.

Category:
Description

Material Composition:

  • BodyAnodized Aluminum 6061-T6 — Type III hardcoat anodize, 25 µm
  • Face PlateSilicon Carbide (SiC) — 2 mm thick, CVD-deposited
  • Orifice PlateStainless Steel 316L — 0.5 mm thick, laser-drilled
  • Seals: Silicone O-ring — High-temp grade, 250°C max
  • Fasteners: Inconel 718 socket-head cap screws

Technical Specifications:

Parameter Value
Wafer Size 300 mm
Number of Orifices 1,200+
Orifice Diameter 0.3 mm (typ)
Gas Inlet 1/2″ VCR Male
Operating Pressure 1 – 10 Torr
Temperature Range 25°C – 400°C
Gas Compatibility SiH₄, NH₃, N₂O, TEOS, O₂, N₂
Uniformity < 1.5% across 300 mm wafer
Particle Rating < 0.12 µm — Class 1

Structural Features:

  • Dual-zone gas delivery — center zone + edge zone, independently controlled
  • Laser-drilled SiC orifice plate — ±5 µm position tolerance
  • Removable face plate for in-situ cleaning via plasma ash

Working Principle:
Process gas enters via VCR inlet, passes through a plenum chamber, and exits through 1,200+ micro-orifices in the SiC face plate. The dual-zone design allows radial gas composition grading for film uniformity optimization.

Applicable Industries:
Semiconductor — PECVD SiN, SiO₂, SiC deposition; ALD high-k dielectrics

Installation Requirements:

  • Torque face plate screws to 8 in-lbs (0.9 N·m) in star pattern
  • Perform He leak check < 1 × 10⁻⁹ Torr·L/s
  • Bake at 250°C for 2 hours before first process run
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