AMAT 0190-07970

Product Series: Applied Materials P5000 / Centura Etch Systems

Product Introduction:
The 0190-07970 is a gas distribution manifold used in Applied Materials semiconductor etch and deposition chambers. It precisely routes process gases (e.g., CF₄, Cl₂, O₂, Ar, N₂) from gas cabinets to the showerhead or pedestal within the chamber.

Category:
Description

Technical Specifications:

Parameter Value
Material Anodized Aluminum 6061-T6 / Stainless Steel 316L
Number of Ports 6–8 (varies by configuration)
Pressure Rating Up to 100 psi (6.9 bar)
Operating Temperature -20°C to +200°C
Surface Finish Electropolished (Ra < 0.4 µm)
Leak Rate < 1 × 10⁻⁹ Torr·L/s (He)
Connections VCR metal-seal fittings
Compatibility AMAT Centura, P5000, Producer platforms

Material Composition:

  • Body: 6061-T6 Aluminum (anodized for corrosion resistance)
  • Seals: Kalrez® FFKM O-rings (chemical-resistant)
  • Fasteners: 316L Stainless Steel bolts
  • Internal Surfaces: Electropolished 316L SS

Structure Features:

  • Multi-port inline manifold with VCR fittings
  • Internal gas channels with CFD-optimized flow paths
  • Quick-disconnect fittings for maintenance
  • Keyed alignment to prevent mis-installation

Working Principle:
Process gases enter through the inlet port and are split into multiple channels via internal passages. Each channel terminates at a VCR fitting that connects to the chamber showerhead. Flow is controlled externally by mass flow controllers (MFCs). The manifold ensures uniform gas distribution and minimal pressure drop.

Advantages & Highlights:

  • Ultra-low leak rate ensures process purity
  • Electropolished internal surfaces minimize particle generation
  • Chemical compatibility with all standard etch gases
  • Modular design allows field replacement without chamber vent

Applicable Industries:

  • Semiconductor Manufacturing (Front-End)
  • MEMS Fabrication
  • LED / Compound Semiconductor Processing

Installation Requirements:

  • Install in cleanroom environment (ISO Class 5 or better)
  • Torque VCR fittings to 25–30 in-lbs per AMAT spec
  • Purge with N₂ before first use
  • Verify leak integrity with helium leak detector

Usage Precautions:

  • Do not use with gases not rated for FFKM seals (e.g., F₂ requires special configuration)
  • Do not exceed 100 psi operating pressure
  • Replace O-rings every 6 months or per PM schedule
  • Do not disassemble in non-cleanroom conditions
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