AMAT 0100-71309

Model Series: Endura / Centura Etch Chambers Product Description: A replaceable chamber liner (also called chamber wall panel) that lines the interior of AMAT plasma etch chambers. It protects the chamber body from plasma erosion and chemical attack while contributing to process uniformity.

AMAT 0100-71311

Model Series: Centura / Endura PVD Modules Product Description: A pneumatically actuated throttle valve used to control chamber pressure in AMAT physical vapor deposition (PVD) and sputter systems. It regulates gas flow to maintain precise process pressure during thin-film deposition.

AMAT 0100-76124

Model Series: Centura / Producer Bias Systems Product Description: A high-voltage DC power supply module used to generate substrate bias voltage in AMAT plasma etch chambers. It provides precise DC bias control from 0V to -5000V for ion energy control during anisotropic etching.

AMAT 0100-77037

Model Series: HiPace Series Equivalent Product Description: A high-capacity turbomolecular vacuum pump used in AMAT cluster tools and standalone process chambers. It achieves high vacuum and ultra-high vacuum conditions required for sputtering, CVD, and etch processes.

AMAT 0100‑00003

Product Name: Stepper Motor Driver Module for Semiconductor Wafer Handling Product Brief: Original Applied Materials motion control drive module deployed on Endura semiconductor processing platforms, drives two‑phase hybrid stepper motors to implement precise wafer transfer robot arm positioning and movement for vacuum wafer handling chambers.

AMAT 0100‑71304

Product Name: Semiconductor Equipment Analog Signal Interface Module Product Brief: Applied Materials signal conditioning I/O module, converts low‑level field sensor analogue signals into digital bus‑compatible signals for cluster tool process monitoring and closed‑loop process control inside semiconductor fabrication tools.

AMAT 0140‑76018

Product Name: Semiconductor Tool Power Distribution Interface Module Product Brief: Applied Materials custom power‑distribution interface board for semiconductor cluster processing‑tools, distributes and switches multiple DC‑power rails for vacuum‑chamber peripheral subsystems, provides circuit‑over‑current‑protection and fault‑diagnostic‑feedback to tool host‑controller.

AMAT 0190-07970

Product Series: Applied Materials P5000 / Centura Etch Systems Product Introduction: The 0190-07970 is a gas distribution manifold used in Applied Materials semiconductor etch and deposition chambers. It precisely routes process gases (e.g., CF₄, Cl₂, O₂, Ar, N₂) from gas cabinets to the showerhead or pedestal within the chamber.

AMAT 0190-15779

Technical Specifications
  • Control Precision: High-resolution encoder enables precise positioning and motion control with minimal error margins.
  • Torque and Inertia: Features high torque output and low inertia for rapid response to control signals, enhancing dynamic system performance.
  • Speed Range: Operates efficiently across a wide speed range, adapting to varying load conditions without compromising stability.
  • Cooling Design: Optimized cooling system ensures stable performance during prolonged high-speed operation, extending service life.
  • Construction: Built with high-quality materials and robust components to withstand harsh industrial conditions, including vibration and temperature fluctuations.

AMAT 0190-24007

Product Name: CPCI-3720CF Single Board Computer (Semiconductor Manufacturing Control Board)
Product Introduction: The AMAT 0190-24007 is a high-performance compact PCI single-board computer manufactured by Applied Materials (MKS-TENTA). It serves as the core control unit for 300mm wafer production lines, executing complex mathematical models to maintain precise balance between chemical gas, plasma, and mechanical polishing processes in semiconductor manufacturing.

AMAT 0190-26873

Product Series: Applied Materials Centura / Producer PECVD & Etch Systems Product Introduction: The 0190-26873 is an RF impedance match network used in Applied Materials plasma etch and PECVD chambers. It matches the 50 Ω output of the RF generator to the variable impedance of the plasma load, maximizing power transfer and minimizing reflected power.

AMAT 0190-27952

Product Series: Applied Materials Centura / Producer Etch Systems Product Introduction: The 0190-27952 is a Johnson-Rahbek electrostatic chuck used to clamp semiconductor wafers during plasma etch processes. It provides uniform clamping force across the wafer surface using high-voltage DC applied between the chuck electrodes and the wafer.